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Mask pellicle is a transparent film pasted on the aluminum alloy frame to prevent dust from falling on the patterned side of the mask. With the protection of this film, dust particles can only fall on one side of the reticle glass or on the protective film. 

Working principle of mask protective film: Because of the physical thickness of the protective film, even if the particles are contaminated in the process of exposure (lithography), the image of particles will not focus on the wafer surface due to the focal length, thus reducing the influence of particle pollutants on lithography. 

Physical protection: protect the pattern on the mask surface from physical damage during handling or use. Prevent dust and other pollutants from falling on the mask surface. 

Chemical protection: to prevent chemical reagents or corrosive gases from reacting with the mask surface.