It is necessary to inspect the mask to determine whether the imaging and surface conditions of the photoresist meet the requirements and whether the basic steps of the next process can be carried out.
It is necessary to inspect the mask to determine whether the imaging and surface conditions of the photoresist meet the requirements and whether the basic steps of the next process can be carried out.
① Check whether the photoresist is scratched, contaminated or incompletely covered under UV lamp.
(2), under the microscope to check whether there is no photoresist pattern, repeated exposure, floating glue, pattern offset (wrong line, dislocation), poor contact, improper exposure, incomplete photoresist coverage, incomplete development, connection, contamination, gap, burr and other phenomena.